Shutter system for shielding a coated substrate during a radiati

Drying and gas or vapor contact with solids – Apparatus – With means to treat gas or vapor

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Details

219388, F26B 328

Patent

active

050481983

ABSTRACT:
A shutter system cooperatively associated with a high temperature lamp-reflector assembly for curing a photosensitive coating on a substrate moving adjacent the lamp-reflector block comprises a reflector block having a cavity within which is mounted a high temperature lamp and a shutter system which includes a double acting cylinder with piston rod, two support-guide rod, bearing assemblies and a flat shutter plate supported in a cantilevered manner from the cylinder piston rod and support-guide rod, bearing assemblies. The shutter plate is moved on signal by the cylinder piston rod to a position between the reflector block and coated substrate to shield the substrate when its movement is interrupted and away from such position when the substrate is moving.

REFERENCES:
patent: 2127956 (1938-08-01), Helmer
patent: 3733709 (1973-05-01), Bassemir et al.
patent: 3745307 (1973-07-01), Peek, Jr. et al.
patent: 3826014 (1974-07-01), Helding
patent: 3829982 (1974-08-01), Pray
patent: 3967385 (1976-07-01), Culbertson
patent: 4005135 (1977-01-01), Helding
patent: 4037329 (1977-07-01), Wallace
patent: 4494316 (1985-01-01), Stephansen et al.

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