Shutter for thin-film processing equipment

Details Shutter for thin-film processing equipment Shutter for thin-film processing equipment

1998-10-20

2000-10-17

Bueker, Richard

Coating processes

Coating by vapor, gas, or smoke

118720, 118723FI, 118723E, 118726, 20419234, 20429811, C23C 1400, C23C 1650

Patent

active

061328057

ABSTRACT:
A shutter assembly located substantially within a thin-film processing chamber includes a plurality of articulatable components that are movable between open and closed positions within the chamber. The articulatable components are preferably arranged in the form of an iris to regulate a size of an opening centered along said central axis. The shutter assembly can be used to isolate transmissions between a process energy source such as a PVD target and a substrate or to limit a range of incidence angles at which the transmissions reach the substrate. The shutter apparatus of this invention does not add any area to the footprint of processing equipment, enables very fast shuttering between open and closed positions, and enables enhanced process control.

REFERENCES:
patent: 3636916 (1972-01-01), Thelen
patent: 3895602 (1975-07-01), Bobenrieth
patent: 4761199 (1988-08-01), Sato
patent: 4950376 (1990-08-01), Hayashi
patent: 4971653 (1990-11-01), Powell et al.
patent: 5192849 (1993-03-01), Moslehi
patent: 5221636 (1993-06-01), Landreau
patent: 5358615 (1994-10-01), Grant
patent: 5746828 (1998-05-01), Boulaev
patent: 6011904 (2000-01-01), Mattord

Affiliated with

Also associated with

Rating

Shutter for thin-film processing equipment does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Shutter for thin-film processing equipment, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Shutter for thin-film processing equipment will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-466076