Shutter device for ion beam etching apparatus and such etching a

Details Shutter device for ion beam etching apparatus and such etching a Shutter device for ion beam etching apparatus and such etching a

1986-04-08

1988-08-02

Schor, Kenneth M.

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

With microwave gas energizing means

20419234, 204298, C23F 102

Patent

active

047611995

ABSTRACT:
A shutter device for use in an etching apparatus using charged particles, which includes at least one sheet-like electrode having an aperture for passage of the charged particles; and a voltage source for selectively applying to the electrode an electric voltage so as to establish at the electrode an electric potential higher than that of the charged particles; wherein the passage of the charged particles through the aperture of said electrode is prevented when the electric potential which is higher than that of the charged particles is established at the electrode by the voltage application by the voltage source.

REFERENCES:
patent: 4491499 (1985-01-01), Jerde et al.
patent: 4496425 (1985-01-01), Kuyel
patent: 4523971 (1985-06-01), Cuomo et al.
patent: 4659449 (1987-04-01), Watanabe

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