Shutter apparatus for fine-tuning a coupled-dual resonator cryst

Details Shutter apparatus for fine-tuning a coupled-dual resonator cryst Shutter apparatus for fine-tuning a coupled-dual resonator cryst

1984-11-29

1986-12-09

Bueker, Richard

Coating apparatus

Gas or vapor deposition

Having means to expose a portion of a substrate to coating...

118720, 118504, 118505, 427100, C23C 1308

Patent

active

046273794

ABSTRACT:
A system for plating resonator electrodes or the like by the vapor deposition process employs one or more shutters between the deposition material source and a plating mask. At least one of the shutters has a pair of apertures aligned with different apertures in the plating mark. In one embodiment comprising a two shutter, four position system, the two shutters may be positioned such that either, both or neither of the resonators can be plated. Because each shutter is either ON or OFF, a simple binary analogy for control of the shutters results.

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