Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1994-02-08
1995-05-09
Weisstuch, Aaron
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
118713, C23C 1452
Patent
active
054136881
ABSTRACT:
A shutter apparatus capable of protecting the interior surface of an evacuable optical coating chamber viewport from the deposition of off-substrate coating material when in the closed position, and exposing the viewport surface to permit viewing through the viewport into the chamber when in the open position. The movement of the shutter between the open and closed positions is accomplished without breaching the chamber seal.
REFERENCES:
patent: 4166018 (1979-08-01), Chapin
patent: 4356073 (1982-10-01), McKelvey
patent: 4422916 (1983-12-01), McKelvey
patent: 4881335 (1989-11-01), Khoshkish
patent: 4911810 (1990-03-01), Lauro et al.
Viratec Thin Films, Inc.
Weisstuch Aaron
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