Shower head structure for processing semiconductor

Details Shower head structure for processing semiconductor Shower head structure for processing semiconductor

2003-02-28

2009-06-02

Zervigon, Rudy (Department: 1792)

Coating apparatus

Control means responsive to a randomly occurring sensed...

Temperature responsive

C116SDIG043, C156S345240

Reexamination Certificate

active

07540923

ABSTRACT:
A shower head structure disposed in a device2for processing a semiconductor while supplying processing gas to a processing space S for storing a heated processed substrate W, comprising a shower head12having a plurality of gas injection holes20B for supplying the processing gas and a light introducing rod68of a radiation thermometer66inserted into at least one of the gas injection holes20B.

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patent: 5846883 (1998-12-01), Moslehi
patent: 6758941 (2004-07-01), Ookawa et al.
patent: 2004/0020599 (2004-02-01), Tanaka et al.
patent: 06204143 (1994-07-01), None
patent: 7-134069 (1995-05-01), None

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