Short wavelength pulsed laser scanner

Incremental printing of symbolic information – Light or beam marking apparatus or processes – Scan of light

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Details

347256, 347260, 347261, 347239, B41J 2435

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active

060379677

ABSTRACT:
A laser pattern generator for semiconductor mask making or direct writing of features on a semiconductor wafer uses a pulsed laser source to achieve high power and short wavelength (e.g. 263 nm or less) radiation, for writing very small-sized features. The laser pulse frequency is either synchronous or asynchronous to the writing grid of the features being written, in various embodiments.

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