Optical: systems and elements – Diffraction – From zone plate
Reexamination Certificate
2007-09-11
2007-09-11
Assaf, Fayez G. (Department: 2872)
Optical: systems and elements
Diffraction
From zone plate
C359S576000, C359S361000, C378S034000
Reexamination Certificate
active
10683872
ABSTRACT:
An extreme ultraviolet (EUV) AIM tool for both the EUV actinic lithography and high-resolution imaging or inspection is described. This tool can be extended to lithography nodes beyond the 32 nanometer (nm) node covering other short wavelength radiation such as soft X-rays. The metrology tool is preferably based on an imaging optic referred to as an Achromatic Fresnel Optic (AFO). The AFO is a transmissive optic that includes a diffractive Fresnel zone plate lens component and a dispersion-correcting refractive lens component. It retains all of the imaging properties of a Fresnel zone plate lens, including a demonstrated resolution capability of better than 25 nanometers and freedom from image distortion. It overcomes the chromatic aberration of the Fresnel zone plate lens and has a larger usable spectral bandwidth. These optical properties and optical system designs enable the development of the AFO-based AIM tool with improved performance that has advantages compared with an AIM tool based on multilayer reflective mirror optics in both performance and cost.
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Wang Yuxin
Yun Wenbing
Assaf Fayez G.
Houston Eliseeva LLP
Xradia, Inc.
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