Short-coupled-path extender for plasma source

Details Short-coupled-path extender for plasma source Short-coupled-path extender for plasma source

1997-01-23

1998-09-29

Breneman, R. Bruce

Coating apparatus

Gas or vapor deposition

With treating means

156345, 118719, 20429826, C23C 1600

Patent

active

058141545

ABSTRACT:
A short-coupled-path extender comprises a two-inch thick housing that inserts as a spacer between a plasma source and a vacuum chamber in various kinds of semiconductor processing equipment. The spacer housing is generally constructed of aluminum and is thermally well-connected to the vacuum chamber and its liquid cooling system to dispose of the heat it collects from the plasma source flow. The plasma source bolts up to a central inlet port on the spacer housing that leads to a first quartz-lined antechamber within. The plasma source flow encounters a traverse metal wall at the back of the first antechamber and is forced to flow radially outward to a system of small outer ports that connect to a second quartz-lined antechamber. The plasma source flow then collects back together and exits the second antechamber through a central outlet port that bolts up to the plasma source seat on the vacuum chamber.

REFERENCES:
patent: 4960071 (1990-10-01), Akahori et al.
patent: 5125358 (1992-06-01), Ueda et al.
patent: 5284544 (1994-02-01), Mizutani et al.
patent: 5433787 (1995-07-01), Suzuki et al.
patent: 5529632 (1996-06-01), Katayama et al.

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