Coating apparatus – Gas or vapor deposition – With treating means
Reexamination Certificate
2006-06-27
2006-06-27
Hassanzadeh, Parviz (Department: 1763)
Coating apparatus
Gas or vapor deposition
With treating means
C156S345100
Reexamination Certificate
active
07066107
ABSTRACT:
A shield system for use in a plasma chamber, such as a source chamber for an ion implantation machine, including a top shield plate configured to be attached with a top interior surface of the plasma chamber; a bottom shield plate configured to be attached with a bottom interior surface of the plasma chamber; and a rear shield plate configured to be attached with a rear interior surface of the plasma chamber, wherein a rear edge of the top shield plate meets a top edge of the rear shield plate, and wherein a rear edge of the bottom shield plate meets a bottom edge of the rear shield plate, such that the top shield plate, the bottom shield plate and the rear shield plate fit together to substantially cover the chamber's interior surfaces, thus reducing depositions on the inside surfaces of the plasma chamber, while the plasma chamber is operating.
REFERENCES:
patent: 5518593 (1996-05-01), Hosokawa et al.
patent: 5641375 (1997-06-01), Nitescu et al.
patent: 5763895 (1998-06-01), Tien et al.
patent: 5788799 (1998-08-01), Steger et al.
patent: 5803977 (1998-09-01), Tepman et al.
patent: 5824197 (1998-10-01), Tanaka
patent: 5851343 (1998-12-01), Hsu et al.
patent: 5891350 (1999-04-01), Shan et al.
patent: 5895923 (1999-04-01), Blake
patent: 5903009 (1999-05-01), Bernstein et al.
patent: 5909031 (1999-06-01), Kellerman et al.
patent: 5951775 (1999-09-01), Tepman
patent: 5964947 (1999-10-01), Zhao et al.
patent: 6051122 (2000-04-01), Flanigan
patent: 6099651 (2000-08-01), Sajoto et al.
patent: 6120660 (2000-09-01), Chu et al.
patent: 6143086 (2000-11-01), Tepman
patent: 6149784 (2000-11-01), Su et al.
patent: 6170429 (2001-01-01), Schoepp et al.
patent: 6171453 (2001-01-01), Chung et al.
patent: 6234219 (2001-05-01), Donohoe
patent: 6251216 (2001-06-01), Okamura et al.
patent: 6284093 (2001-09-01), Ke et al.
patent: 6403491 (2002-06-01), Liu et al.
patent: 6583427 (2003-06-01), Edmonds et al.
patent: 2003/0038252 (2003-02-01), Danciu et al.
Crowell Michelle
Hassanzadeh Parviz
Hynix Semiconductor Manufacturing America Inc.
Kusha Babak
Townsend and Townsend / and Crew LLP
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