Shielding for arc suppression in rotating magnetron sputtering s

Details Shielding for arc suppression in rotating magnetron sputtering s Shielding for arc suppression in rotating magnetron sputtering s

1993-11-29

1995-11-28

Nguyen, Nam

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

20419223, 20429811, 20429822, 20429828, C23C 1434

Patent

active

054704529

ABSTRACT:
A cathode body for a rotating cylindrical magnetron wherein the magnetron provides a sputtering zone extending along the length of the cathode body and circumferentially along a relatively narrow region thereof. The cathode body includes an elongated tubular member having a target material at the outer surface thereof. A collar of electrically-conductive material is located at at least one end of the tubular member, and extends along the tubular member from that one end into the erosion zone. A sleeve of electrically-conductive material may extend circumferentially around the collar.

REFERENCES:
patent: 3897325 (1975-07-01), Aoshima et al.
patent: 4116794 (1978-09-01), Penfold et al.
patent: 4166018 (1979-08-01), Chapin
patent: 4221652 (1980-09-01), Kuriyama
patent: 4356073 (1982-10-01), McKelvey
patent: 4422916 (1983-12-01), McKelvey
patent: 4443318 (1984-04-01), McKelvey
patent: 4445997 (1984-07-01), McKelvey
patent: 4466877 (1984-08-01), McKelvey
patent: 4485000 (1984-11-01), Kawaguchi et al.
patent: 4486289 (1984-12-01), Parsons et al.
patent: 4519885 (1985-05-01), Innis
patent: 4545882 (1985-10-01), McKelvey
patent: 4619755 (1986-10-01), Hessberger et al.
patent: 4668373 (1987-05-01), Rille et al.
patent: 4818358 (1989-04-01), Hubert et al.
patent: 4904362 (1990-02-01), Gaertner et al.
patent: 5047131 (1991-10-01), Wolfe et al.
Hasokawa et al., "Self sputtering . . . sputtering", J. Vac. Sci. Technol., vol. 14, No. 1, Jan./Feb. 1977.
"DC Reactive Sputtering Using A Rotating Cylindrical Magnetron," Hofmann, J., Proceedings of the 32nd Annual Conference of the Society of Vacuum Coaters, pp. 297-300 (1989).

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