Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1995-03-21
1998-03-10
Nguyen, Nam
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
20429828, 20429811, C23C 1434
Patent
active
057257469
ABSTRACT:
A cathode body for a rotating cylindrical magnetron wherein the magnetron provides a sputtering zone extending along the length of the cathode body and circumferentially along a relatively narrow region thereof. The cathode body includes an elongated tubular member having a target material at the outer surface thereof. A collar of electrically-conductive material is located at at least one end of the tubular member, and extends along the tubular member from that one end into the erosion zone. A sleeve of electrically-conductive material may extend circumferentially around the collar.
REFERENCES:
patent: 3897325 (1975-07-01), Aoshima et al.
patent: 4116794 (1978-09-01), Penfold et al.
patent: 4166018 (1979-08-01), Chapin
patent: 4221652 (1980-09-01), Kuriyama
patent: 4356073 (1982-10-01), McKelvey
patent: 4362611 (1982-12-01), Logan
patent: 4422916 (1983-12-01), McKelvey
patent: 4443318 (1984-04-01), McKelvey
patent: 4445997 (1984-05-01), McKelvey
patent: 4466877 (1984-08-01), McKelvey
patent: 4485000 (1984-11-01), Kawaguchi et al.
patent: 4486289 (1984-12-01), Parsons
patent: 4519985 (1985-05-01), Innis
patent: 4545882 (1985-10-01), McKelvey
patent: 4619755 (1986-10-01), Hessberger et al.
patent: 4668358 (1987-05-01), Rille et al.
patent: 4818358 (1989-04-01), Hubert et al.
patent: 4904362 (1990-02-01), Gaertner et al.
patent: 5047131 (1991-09-01), Wolfe et al.
Hosokawa, et al., "Self-Sputtering Phenomena in High-Rate Coaxial Cylindrical Magnetron Sputtering", J. Vac. Sci. Technol., vol. 14, No. 1, Jan./Feb. pp. 143-146 (1977).
Hoffmann, "DC Reactive Sputtering Using Rotating Cylindrical Magnetron", Proc. 32nd Annual Conf. Soc. Vac. Coaters, pp. 297-300 (1989).
Wright, et al., "Design Advances and Applications of the Rotatable Cylindrical Magnetron", J. Vac. Sci. Technol. vol. 4, No. 3, Part 1, pp. 388-392 (1986).
Wright, "Recent Advances in the Design and Application of the Rotable Cylindrical Magnetron", Annual Technical Conference, Soc. Vac. Coaters, pp. 443-465 (1986).
Aronson, et al., "Inline Production Magnetron Sputtering," Vacuum, vol. 27, No. 3, pp. 151-153 (1977).
Bjornard Erik J.
Dickey Eric R.
Nguyen Nam
Viratec Thin Films, Inc.
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