Electric heating – Metal heating – By arc
Reexamination Certificate
2007-12-18
2007-12-18
Hoang, Tu Ba (Department: 3742)
Electric heating
Metal heating
By arc
C219S121360, C219S121440, C219S121470, C219S121590, C118S7230AN, C118S7230ER, C156S345350, C156S345480, C204S298110, C204S298080
Reexamination Certificate
active
10907024
ABSTRACT:
A monolithic microplasma source includes a dielectric substrate having an outer surface that is exposed to a time varying electric field. A gap layer is positioned on an inner surface of the dielectric substrate. A shield including a slit is positioned on the gap layer. A relief structure is formed in at least one of the gap layer and the dielectric substrate. The dimensions of the gap layer, the slit in the shield, and the relief structure are chosen so as to prevent a formation of a continuous film across the relief structure. A chamber containing a gas is positioned adjacent to the shield so that the gas is ionized to form a microplasma when an electric field is induced in the chamber by the incident time varying electric field.
REFERENCES:
patent: 4575241 (1986-03-01), Demers et al.
patent: 4664477 (1987-05-01), Andrieu et al.
patent: 4820048 (1989-04-01), Barnard
patent: 4888597 (1989-12-01), Rebiez et al.
patent: 4918031 (1990-04-01), Flamm et al.
patent: 4973159 (1990-11-01), Sohma et al.
patent: 5234529 (1993-08-01), Johnson
patent: 5483337 (1996-01-01), Barnard et al.
patent: 5526172 (1996-06-01), Kanack
patent: 5570179 (1996-10-01), Weckstrom
patent: 5596407 (1997-01-01), Zander et al.
patent: 5654796 (1997-08-01), Mundt
patent: 5942855 (1999-08-01), Hopwood
patent: 5982334 (1999-11-01), Manasson et al.
patent: 5986747 (1999-11-01), Moran
patent: 6043881 (2000-03-01), Wegrzyn et al.
patent: 6048798 (2000-04-01), Gadgil et al.
patent: 6132566 (2000-10-01), Hofmann et al.
patent: 6313803 (2001-11-01), Manasson et al.
patent: 6359250 (2002-03-01), Blonigan et al.
patent: 6381014 (2002-04-01), Platzer et al.
patent: 6388632 (2002-05-01), Murakawa et al.
patent: 6429935 (2002-08-01), Duan
patent: 6459066 (2002-10-01), Khater et al.
patent: 6523493 (2003-02-01), Brcka
patent: 6538734 (2003-03-01), Powell
patent: 6565717 (2003-05-01), Leet et al.
patent: 6577390 (2003-06-01), Efthimion
patent: 6594010 (2003-07-01), Malczweski et al.
patent: 6643014 (2003-11-01), Chevalier et al.
patent: 6685799 (2004-02-01), Davis et al.
patent: 6738600 (2004-05-01), Newton et al.
patent: 6815739 (2004-11-01), Huff et al.
patent: 6835949 (2004-12-01), Weiss et al.
patent: 6914005 (2005-07-01), Furuse et al.
patent: 6917165 (2005-07-01), Hopwood et al.
patent: 6953908 (2005-10-01), Ishii et al.
patent: 2002/0071117 (2002-06-01), Ukon et al.
patent: 2002/0092618 (2002-07-01), Collins
patent: 2002/0093652 (2002-07-01), Powell
patent: 2003/0080685 (2003-05-01), Grotjohn et al.
patent: 2003/0128919 (2003-07-01), Weiss et al.
patent: 2003/0214651 (2003-11-01), Hudak
patent: 2004/0164682 (2004-08-01), Hopwood et al.
patent: 2005/0098117 (2005-05-01), DiVergilio et al.
patent: 2005/0205532 (2005-09-01), Patrick et al.
patent: 2005/0222781 (2005-10-01), Yue et al.
patent: 2003234333 (2003-08-01), None
Gaurand, et al., An Innovative Plasma Source For On Line Process Monitoring, Alcatel Vacuum Technology France, Annecy, France.
Messier, et al., Miniaturization Of Inductively Coupled Plasma Sources, Department of Electrical and Computer Engineering, Northeastern University, Boston, MA, USA.
Hopwood, et al., Fabrication And Characterization Of A Micromachined 5mm Inductively Coupled Plasma Generator, J. Vac. Sci. Technol. B, Sep./Oct. 2000, pp. 2446-2451, vol. 18, No. 5.
Johnson, et al., High-Density Plasma Sources, Noyes, 1995.
Doughty. Microplasma Emission Spectrometer, U.S. Appl. No. 10/708,450, filed Mar. 4, 2004.
Hopwood, A Microfabricated Inductively-Coupled Plasma Generator, pp. 1-17, Department of Electrical and Computer Engineering, Northeastern University, Boston, MA, USA.
Ralis Stephen J.
Rauschenbach Kurt
Rauschenbach Patent Law Group, LLC
Verionix Incorporated
LandOfFree
Shielded monolithic microplasma source for prevention of... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Shielded monolithic microplasma source for prevention of..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Shielded monolithic microplasma source for prevention of... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3850996