Shaped sputter shields for improved ion column operation

Details Shaped sputter shields for improved ion column operation Shaped sputter shields for improved ion column operation

2005-12-20

2005-12-20

Nguyen, Kiet T. (Department: 2881)

Radiant energy

Ion generation

Field ionization type

C250S505100

Reexamination Certificate

active

06977384

ABSTRACT:
The invention adds one or more surface contour(s) to the bombarded area(s) within ion columns to greatly reduce the likelihood that back sputtered material will reach the ion generating source. A number of different surface contours are disclosed including angled surfaces, surfaces defining cups to capture back sputtered material, pre-textured and forested surfaces. The different surfaces can be used in any combination. The reduction in back sputtered material reaching the ion source reduces the time to stability, greatly increases the working stability, and increases the lifespan of the source.

REFERENCES:
patent: 4698236 (1987-10-01), Kellogg et al.
patent: 5034612 (1991-07-01), Ward et al.

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