Shaped MEMS contact

Semiconductor device manufacturing: process – Making device or circuit responsive to nonelectrical signal

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C200S181000, C257SE21001

Reexamination Certificate

active

07601554

ABSTRACT:
A MEMS switch fabrication process and apparatus inclusive of a bulbous rounded surface movable contact assembly that is integral with the switch movable element and achieving of long contact wear life with low contact electrical resistance. The disclosed process is compatible with semiconductor integrated circuit fabrication materials and procedures and includes an unusual photoresist reflow step in which the bulbous contact shape is quickly defined in three dimensions from more easily achieved integrated circuit mask and etching-defined precursor shapes. A plurality of differing photoresist materials are used in the process. A large part of the contact and contact spring formation used in the invention is accomplished with low temperature processing including electroplating. Alternate processing steps achieving an alloy metal contact structure are included. Use of a subroutine of processing steps to achieve differing but related portions of the electrical contact structure is also included.

REFERENCES:
patent: 5597064 (1997-01-01), Ozaki et al.
patent: 6373007 (2002-04-01), Calcatera et al.
patent: 6624498 (2003-09-01), Filas et al.
patent: 6655964 (2003-12-01), Fork et al.
patent: 6793753 (2004-09-01), Unger et al.
patent: 2003/0116417 (2003-06-01), DeReus
patent: 2003/0116848 (2003-06-01), Cunningham et al.
patent: 2003/0117257 (2003-06-01), Cunningham
patent: 2003/0155643 (2003-08-01), Freidhoff
patent: 2003/0184419 (2003-10-01), Ma
patent: 2003/0223174 (2003-12-01), Prophet
patent: 2003/0230798 (2003-12-01), Lin et al.
patent: 2004/0012298 (2004-01-01), Cunningham et al.
patent: 2004/0016995 (2004-01-01), Kuo et al.
patent: 2004/0067604 (2004-04-01), Ouellet et al.
S. Majumder et al, “MEMS Switches”, IEEE Instrumentation & Measurement Magazine, Mar. 2003, pp. 12-15.
S. Duffy et al., “MEMS Microswitches for Reconfigurable Microwave Circuitry”, IEEE Microwave and Wireless Components Letters, Mar. 2001, pp. 106-108, vol. 11.
J. Schimkat, “Contact Measurements Providing Basic Design Data for Microrelay Actuators”, Sensors and Actuators, 1999, pp. 138-143, vol. 73.
Ronald Coutu et al., “Selecting Metal Alloy Electric Contact Materials for MEMS Switches”, Journal of Micromechanics and Microengineering, 2004, pp. 1157-1164, vol. 14.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Shaped MEMS contact does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Shaped MEMS contact, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Shaped MEMS contact will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-4109837

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.