Shaped body having a high silicon dioxide content and a process

Details Shaped body having a high silicon dioxide content and a process Shaped body having a high silicon dioxide content and a process

1996-04-24

1997-10-07

Marcantoni, Paul

Compositions: ceramic

Ceramic compositions

Pore-forming

501 85, 501133, 501154, C04B 3514

Patent

active

056747926

ABSTRACT:
A shaped body of amorphous silicon dioxide, which has a chemical purity of at least 99.9% and a cristobalite content of at most 1% and which is impermeable to gas, is known. To provide shaped bodies of amorphous silicon dioxide which have a high precision, which can be small or large in size and of simple to complicated shape, which have a chemical purity of at least 99.9%, are impermeable to gas above wall thicknesses of 1 mm, which have a high cold flexural strength, low thermal conductivity and low radiation of heat, which are thermal shock resistant and can be exposed repeatedly or also long-term to temperatures in the range from 1000.degree. to 1300.degree. C. and which can be welded in a sharply delineated manner without spreading joins and which have a low spectral transmission from the ultraviolet to the middle infrared spectral region, the shaped body is opaque, contains pores, at a wall thickness of 1 mm has a direct spectral transmission which is virtually constant in the wavelength range from .lambda.=190 nm to .lambda.=2650 nm and is below 10%, and it has a density which is at least 2.15 g/cm.sup.3. A process for producing such shaped bodies is also provided.

REFERENCES:
patent: 3301635 (1967-01-01), Bergna et al.
patent: 3972704 (1976-08-01), Loxley et al.
patent: 4040795 (1977-08-01), Jung
patent: 5063003 (1991-11-01), Gonzalez-Oliver
patent: 5302364 (1994-04-01), Feinblum
patent: 5360773 (1994-11-01), Winkelbauer et al.
Keramische Zeitschrift, vol. 38, No. 8, 1986, pp. 442-445.

Affiliated with

Also associated with

Rating

Shaped body having a high silicon dioxide content and a process does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Shaped body having a high silicon dioxide content and a process , we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Shaped body having a high silicon dioxide content and a process will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2357061