Shaped anode and anode-shield connection for vacuum physical...

Details Shaped anode and anode-shield connection for vacuum physical... Shaped anode and anode-shield connection for vacuum physical...

2008-12-12

2011-11-29

Rosasco, Stephen (Department: 1721)

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

C204S298140

Reexamination Certificate

active

08066857

ABSTRACT:
A physical vapor deposition apparatus includes a vacuum chamber with side walls, a cathode, a radio frequency power supply, a substrate support, a shield, and an anode. The cathode is inside the vacuum chamber, and the cathode includes a sputtering target. The radio frequency power supply is configured to apply power to the cathode. The substrate support is inside and electrically isolated from the side walls of the vacuum chamber. The shield is inside and electrically connected to the side walls of the vacuum chamber. The anode is inside and electrically connected to the side walls of the vacuum chamber. The anode includes an annular body and an annular flange projecting inwardly from the annular body, and the annular flange is positioned to define a volume below the target for the generation of plasma.

REFERENCES:
patent: 4622122 (1986-11-01), Landau
patent: 5202008 (1993-04-01), Talieh et al.
patent: 5234561 (1993-08-01), Randhawa et al.
patent: 5736021 (1998-04-01), Ding et al.
patent: 6132550 (2000-10-01), Shiomi
patent: 6227140 (2001-05-01), Kennedy et al.
patent: 6471830 (2002-10-01), Moslehi et al.
patent: 6726805 (2004-04-01), Brown et al.
patent: 7001491 (2006-02-01), Lombardi et al.
patent: 7368041 (2008-05-01), Krassnitzer
patent: 7382661 (2008-06-01), Lin
patent: 2010/0147681 (2010-06-01), Li et al.
patent: 05-263237 (1993-10-01), None
patent: 2007-042818 (2007-02-01), None
patent: 10-0517474 (2005-12-01), None
International Search Report and Written Opinion from International Application No. PCT/US2009/067147 dated Jul. 9, 2010, 8 pgs.

Affiliated with

Also associated with

Rating

Shaped anode and anode-shield connection for vacuum physical... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Shaped anode and anode-shield connection for vacuum physical..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Shaped anode and anode-shield connection for vacuum physical... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-4303441