Shadow mask including electron reflection layer and method for m

Details Shadow mask including electron reflection layer and method for m Shadow mask including electron reflection layer and method for m

1997-02-25

1998-03-31

Ramsey, Kenneth J.

Electric lamp or space discharge component or device manufacturi

Process

Electrode making

313402, H01J 2907

Patent

active

057331634

ABSTRACT:
A method for manufacturing a shadow mask including an electron reflection layer on the surface of the shadow mask on which electrons impact. The electron refection layer is formed by spray coating a composition including an inorganic binder and a bismuth ammonium citrate solution containing 10-50 wt % of bismuth, and heat treating the coated shadow mask. The method is simple in application and greatly reduces hole-blocking and thermal deformation of the shadow mask, improving color purity of a reproduced image and enhancing the quality of the image.

REFERENCES:
patent: 4442376 (1984-04-01), Van Der Waal et al.
patent: 4983136 (1991-01-01), Okuda

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