Shadow mask for cathode ray tube

Details Shadow mask for cathode ray tube Shadow mask for cathode ray tube

2005-06-14

2005-06-14

Patel, Ashok (Department: 2879)

Electric lamp and discharge devices

Cathode ray tube

Shadow mask, support or shield

C313S403000, C313S407000, C313S408000

Reexamination Certificate

active

06906454

ABSTRACT:
A shadow mask includes an aperture area having a plurality of apertures through which electron beams pass; a non-aperture area extending a from a circumference of the aperture area; and a skirt formed extending from an outer circumference of the non-aperture area at a predetermined angle, wherein the front surface of the aperture area is formed satisfying the following conditions,in-line-formulae description="In-line Formulae" end="lead"?100%<RMV′/RMV<110%in-line-formulae description="In-line Formulae" end="tail"?in-line-formulae description="In-line Formulae" end="lead"?120%<RMS/RMV′<150%in-line-formulae description="In-line Formulae" end="tail"?where RMV is a vertical radius of curvature of the front surface of the aperture area with respect to a vertical direction passing through a center of the aperture area, RMS is a vertical radius of curvature with respect to a short side of the aperture area, and RMV′ is a vertical radius of curvature of the front surface of the aperture area with respect to the vertical direction at a location on a horizontal axis passing through the center of the aperture area.

REFERENCES:
patent: 5606217 (1997-02-01), Hirai et al.
patent: 2001/0011864 (2001-08-01), Nose et al.
patent: 2001-319600 (2001-11-01), None
Patent Abstract of Japan, Publication No. 2001-319600, Published on Nov. 16, 2001, in the name of Watanabe Mitsuru, et al.

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