Shadow mask and manufacturing method thereof

Details Shadow mask and manufacturing method thereof Shadow mask and manufacturing method thereof

2011-08-30

2011-08-30

Angebranndt, Martin J (Department: 1722)

Radiation imagery chemistry: process, composition, or product th

Producing cathode-ray tube or element thereof

C430S320000, C430S005000, C313S402000

Reexamination Certificate

active

08007967

ABSTRACT:
Disclosed is a shadow mask having a fine slit that can improve precision and resolution of a pattern by reducing side etching during an etching process of a mask substrate, and a manufacturing method thereof. The shadow mask includes a mask substrate, a slit region formed by penetrating through the mask substrate, the slit region having a plurality of undercut portions at respective sides thereof, each undercut portion having a unit thickness, and a shadow region provided in the mask substrate, the shadow region corresponding to a region other than the slit region.

REFERENCES:
patent: 5164021 (1992-11-01), Kato et al.
patent: 2004/0067346 (2004-04-01), Hofmann et al.
patent: 62042523 (1987-02-01), None
patent: 09 157799 (1997-06-01), None
patent: 2002-212763 (2002-07-01), None
patent: 2003-229073 (2003-08-01), None
Translation JP-2003-229073(Aug. 2003).
Translation JP-2002-212763(Jul. 2002).
Translation JP-09157799.

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