Sequential scanning wavefront measurement and retinal...

Details Sequential scanning wavefront measurement and retinal... Sequential scanning wavefront measurement and retinal...

2007-11-20

2007-11-20

Lester, Evelyn A. (Department: 2873)

Optics: eye examining, vision testing and correcting

Eye examining or testing instrument

Objective type

C351S211000, C351S239000, C351S243000, C351S247000

Reexamination Certificate

active

10498455

ABSTRACT:
An improved sequential scanning method and apparatus for measuring wavefront aberration involves angularly displacing a measurement beam from a parallel beam striking the corneal surface at a desired location and using the displacement of an image on a detector between the angularly displaced beam and a reference beam to obtain a more accurate wavefront measurement than provided by the displacement between the parallel beam and a reference beam conventionally used for such wavefront aberration measurement. A method and related apparatus for determining a retinal topography relies on using the improved measurement method and apparatus in conjunction with other ocular data to determine changes in the bulbous length of the eye based upon retinal image displacement.

REFERENCES:
patent: 6634750 (2003-10-01), Neal et al.

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