Sequential peeling for mask preparation for fabrication of micro

Details Sequential peeling for mask preparation for fabrication of micro Sequential peeling for mask preparation for fabrication of micro

1973-05-08

1976-02-24

Kimlin, Edward C.

Gas separation: apparatus

Electric field separation apparatus

With means to add charged solid or liquid particles to...

96 362, 96 383, 96 41, 96 44, G03C 504, G03C 500

Patent

active

039402738

ABSTRACT:
A method is disclosed for preparing masks for photo etch purposes. Preselected circuit combinations are scribed in an opaque film supported by a translucent film. Beginning with the most simple circuit combination, the scribed opaque film is peeled away and the resultant circuit is photographed. The next most simple circuit combination of scribed film is peeled away and the new circuit is photographed. This stripping and photographing process is continued until all circuit combinations are photographed from a single art work.

REFERENCES:
patent: 3157499 (1964-11-01), Trusheim
patent: 3558312 (1971-01-01), Fucko
patent: 3617267 (1971-11-01), Kinney
patent: 3649273 (1972-03-01), Miller
patent: 3663223 (1972-05-01), Camenzino
patent: 3669666 (1972-06-01), Kleitman

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