Electrolysis: processes – compositions used therein – and methods – Electrolytic coating – Depositing predominantly single metal or alloy coating on...
Reexamination Certificate
2005-03-08
2005-03-08
Nguyen, Nam (Department: 1742)
Electrolysis: processes, compositions used therein, and methods
Electrolytic coating
Depositing predominantly single metal or alloy coating on...
C205S123000, C205S125000, C205S920000
Reexamination Certificate
active
06863793
ABSTRACT:
A continuous layer of a metal is electrodeposited onto a substrate having both hydrodynamically inaccessible recesses and hydrodynamically accessible recesses on its surface by a twostep process in which the hydrodynamically inaccessible recesses are plated using a pulsed reversing current with cathodic pulses having a duty cycle of less than about 50% and anodic pulses having a duty cycle of greater than about 50% and the hydrodynamically accessible recesses are then plated using a pulsed reversing current with cathodic pulses having a duty cycle of greater than about 50% and anodic pulses having a duty cycle of less than about 50%.
REFERENCES:
patent: 3802854 (1974-04-01), Mueller-Dittmann et al.
patent: 4140596 (1979-02-01), Wobking
patent: 4396467 (1983-08-01), Anthony
patent: 4519877 (1985-05-01), Wiech
patent: 4666567 (1987-05-01), Loch
patent: 5863406 (1999-01-01), Mazzoni et al.
patent: 5972192 (1999-10-01), Dubin et al.
patent: 5980721 (1999-11-01), Prevotat et al.
West, Alan C. et al., “Pulse Reverse Copper Electrodeposition of High Aspect Ratio Trenches and Vias,” J. Electrochem. Soc., vol. 45, No. 9, pp. 3070-3074, Sep. 1998.
Inman Maria E.
Sun Jenny J.
Taylor E. Jennings
Faraday Technology Marketing Group LLC
Nguyen Nam
Nicolas Wesley A.
Vorys Sater Seymour and Pease LLP
LandOfFree
Sequential electrodeposition of metals using modulated... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Sequential electrodeposition of metals using modulated..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Sequential electrodeposition of metals using modulated... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3411583