Separation membrane complex, and method for manufacturing...

Liquid purification or separation – Filter – Supported – shaped or superimposed formed mediums

Reexamination Certificate

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C210S483000, C210S488000, C210S503000, C210S504000, C210S505000, C210S506000, C210S509000, C210S510100, C502S401000, C502S402000, C502S405000

Reexamination Certificate

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07971729

ABSTRACT:
A separation membrane complex where a carbon membrane is formed directly on a porous body (surface layer) and an intermediate layer has a thickness of 10 to 100 μm can be used as a filter having improved flux and selectivity in comparison with a conventional one.

REFERENCES:
patent: 4077885 (1978-03-01), van Heuven et al.
patent: 6037292 (2000-03-01), Lai et al.
patent: 2004/0182242 (2004-09-01), Mitani et al.
patent: 2006/0288677 (2006-12-01), Kaigawa et al.
patent: 2008/0105613 (2008-05-01), Ichikawa et al.
patent: 2009/0220414 (2009-09-01), Mizuno
patent: 51-087179 (1976-07-01), None
patent: 02-229529 (1990-09-01), None
patent: 11-033322 (1999-02-01), None
patent: 2002-066280 (2002-03-01), None
patent: 2002-293656 (2002-10-01), None
patent: 2004-275858 (2004-10-01), None
patent: 3647985 (2005-02-01), None
patent: 2006-212480 (2006-08-01), None
patent: 2005/087355 (2005-09-01), None
patent: 2007/029464 (2007-03-01), None
patent: 2008/010452 (2008-01-01), None
patent: 2008/056542 (2008-05-01), None

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