Separately etching insulating layer for contacts within array an

Details Separately etching insulating layer for contacts within array an Separately etching insulating layer for contacts within array an

1995-06-07

1997-12-02

Chaudhari, Chandra

Fishing, trapping, and vermin destroying

437181, 437183, H01L 2144

Patent

active

056935676

ABSTRACT:
A process of producing a product such as an x-ray sensor array performs two etching operations on an insulating layer to expose different parts of a conductive layer. One etch exposes part of the conductive layer in each unit of cell circuitry in the array without exposing the contact pads at the array's periphery. Then, a conductive layer including ITO is deposited over the insulating layer and patterned to form a conductive element for each unit, with the conductive element contacting the exposed part of the conductive layer. Afterward, a second etch exposes contact pads at the periphery of the array. As a result, the contact pads have high quality surfaces, facilitating testing and wire bonding.

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