Sensor for pulsed deposition monitoring and control

Coating apparatus – Control means responsive to a randomly occurring sensed... – Responsive to condition of coating material

Reexamination Certificate

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Reexamination Certificate

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07735452

ABSTRACT:
Delivery of gas by a pulsed gas delivery device is monitored using a sensor. The sensor may include a source that generates radiation at a spectral range that includes an absorption frequency of the gas being delivered. The radiation is transmitted through a receptacle into which the delivered gas has been received. A detector detects the intensity of the radiation that reaches the detector from the source after transmission through the gas in the receptacle. A controller measures a precise quantity of the gas that was delivered by the gas delivery device, by determining from the detected intensity the amount of the radiation that was absorbed by the gas in the receptacle. The controller monitors in real time the delivery of the gas, by adaptively adjusting the quantity of gas being delivered to a desired quantity. The sensor and controller can also monitor for failures or for out-of-specification behavior of the gas delivery device.

REFERENCES:
patent: 5196784 (1993-03-01), Estes, Jr.
patent: 5550636 (1996-08-01), Hagans et al.
patent: 5851842 (1998-12-01), Katsumata et al.
patent: 6028312 (2000-02-01), Wadsworth et al.
patent: 2003/0143747 (2003-07-01), Bondestam et al.
patent: 2003/0200924 (2003-10-01), Ko et al.
patent: 2003/0219528 (2003-11-01), Carpenter et al.
patent: 2004/0007180 (2004-01-01), Yamasaki et al.
patent: 2005/0069632 (2005-03-01), Yamasaki et al.
patent: 2005/0069641 (2005-03-01), Matsuda et al.
patent: 2005/0095859 (2005-05-01), Chen et al.
patent: WO 2004/010462 (2004-01-01), None
patent: WO 2004/088415 (2004-10-01), None
patent: WO 2005/003406 (2005-10-01), None
patent: WO 2005/103328 (2005-11-01), None
patent: WO 2006/065426 (2006-06-01), None
“Handbook of Modern Analytical Instruments”, By Raghbir Singh Khandpur, 1981, TAB Books Inc.
PCT International Search Report for related PCT Application No. PCT/US2006/025338 (5 pages).
PCT Written Opinion of the International Searching Authority for related PCT Application No. PCT/US2006/025338 (7 pages).

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