Etching a substrate: processes – Forming or treating optical article
Reexamination Certificate
2011-03-01
2011-03-01
Alanko, Anita K (Department: 1713)
Etching a substrate: processes
Forming or treating optical article
C216S056000, C216S083000
Reexamination Certificate
active
07897057
ABSTRACT:
A gas sensor system and its method of fabrication is disclosed. The sensor system comprises an optrode, light source, and a light detector. In a sensor for hydrogen gas, the optrode is comprised of a porous substrate into which an intimate mixture of reagent and catalyst is incorporated. The mixture reacts with the hydrogen to produce a color/intensity change in relation to the concentration of gas. The optrode further includes a reversing agent, boron, to restore the benchmark conditions of the sensor system in real-time. The method of fabricating the optrode includes the steps of cleaning; etching to achieve the proper porosity; incorporating the reagent, catalyst, and reversing agent using capillary action; and removing excess reagent and catalyst.
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Goswam Kisholoy
O'Connor Paul B.
Alanko Anita K
Cohen Lawrence S.
Optech Ventures, LLC
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