Sensor for controlling water quality of reactor and method of co

Details Sensor for controlling water quality of reactor and method of co Sensor for controlling water quality of reactor and method of co

1990-10-25

1993-04-13

Williams, Hezron E.

Measuring and testing

Specimen stress or strain, or testing by stress or strain...

By loading of specimen

73776, G01N 1908

Patent

active

052012298

ABSTRACT:
An element (e.g., a sensor) has a fine-line thin film of a conductor formed on a non-conductive substrate, and a change of physical properties (e.g., deformation) of the substrate or the ambient environment is detected through a change in physical properties of the conductor. The element is manufactured by forming a layered film, composed of a semiconductor and a conductor, on the substrate, and forcibly diffusing part of this film, e.g., by selective irradiation with high-energy ions, to form this part into an alloy semi-conductor, thereby providing a two-dimensional pattern of the fine lines of the conductor and the semiconductor. By arranging a plurality of fine lines of a conductor transversely to a direction of growth of a crack in the substrate, crack in the substrate is detected through a change in electrical resistance of the fine lines. A dissolved oxygen sensor, a hydrogen sensor, and an electrical conductivity sensor (of an ambient medium) can also be provided. To control water chemistry of a reactor, an amount of a water chemistry improving agent injected is controlled in accordance with an output of a water chemistry measurement sensor provided in water in a pressure vessel of the reactor. One or more of a dissolved oxygen sensor, a hydrogen sensor and an electrical conductivity sensor are formed directly on a surface of a structural material of the reactor.

REFERENCES:
patent: 3596269 (1971-07-01), Laska
patent: 4255974 (1981-03-01), Dufrane et al.

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