Sensor element with removal resistance region

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Responsive to non-optical – non-electrical signal

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257517, 257518, 257520, 7351416, 7351421, 7351422, 7351433, 7351434, 73DIG1, 73DIG4, 438 50, 438 52, H01L 2720, H01L 2984

Patent

active

059988169

ABSTRACT:
A sensor element provided with a silicon substrate having a semiconductor circuit, a sensing-element portion formed on the silicon substrate and connected to the semiconductor circuit, and a cavity portion formed by removing a silicon substrate portion below the sensing-element portion, in which a removal resistance region having resistance against substrate removal is provided in the silicon substrate between the semiconductor circuit and the cavity portion.

REFERENCES:
patent: 5316979 (1994-05-01), Mac Donald et al.
patent: 5503017 (1996-04-01), Mizukoshi
patent: 5576250 (1996-11-01), Dien et al.
patent: 5659138 (1997-08-01), Iwata et al.
patent: 5682053 (1997-10-01), Wiszniewski
patent: 5698112 (1997-12-01), Naeher et al.
patent: 5834333 (1998-11-01), Seefeldt et al.
F. Chang, et al., "Gas-phase Silicon Micromachining with Xenon Difluoride", SPIE, vol. 2641, 1995, pp. 117-128.

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