Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1990-09-05
1992-08-18
James, Andrew J.
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
357 2315, 204403, 204412, H01L 2966, H01L 2996
Patent
active
051403935
ABSTRACT:
A sensor device comprising a substrate and a sensor formed on thereof which is made of a metal, metallic oxide, semiconductor, dielectric or organic material, the sensor having projections or indentations formed on or in its surface with optional predetermined shape and dimensions; which is useful as a chemical sensor, biosensor or physical sensor device of improved performance and function.
REFERENCES:
patent: 4020830 (1977-05-01), Johnson et al.
patent: 4218298 (1980-08-01), Shimada et al.
patent: 4411741 (1983-10-01), Janata
patent: 4486292 (1984-12-01), Blackburn
patent: 4490216 (1984-12-01), McConnell
patent: 4644380 (1987-02-01), Zemel
"The Impact of Mosfet-Based Sensors", by P. Bergveld Presented at the Third International Conference of Solid-State Sensors and Actuators (Transducers '85), Philadelphia, Pa., Jun. 11-14, 1985.
Hijikihigawa Masaya
Kataoka Shoei
Cave Bryan
Crane Sara W.
James Andrew J.
Sharp Kabushiki Kaisha
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