Sensor arrangement

Details Sensor arrangement Sensor arrangement

1994-09-28

1997-11-11

Warden, Robert J.

Electrolysis: processes, compositions used therein, and methods

Electrolytic coating

Coating selected area

205157, 205210, 205229, 205333, 205665, 205666, 205640, 205674, 205667, 422 8201, C25D 502

Patent

active

056859694

ABSTRACT:
A sensor arrangement having a substrate of doped silicon with channels in a principal face, a selective means for detecting a material, the selective means covering the principal face without filling the channels, and a measuring instrument for registering a physical quantity dependent on the influence of a material is provided. A catalytic layer is particularly used as selective means and a temperature sensor is particularly used as measuring instrument. Alternatively, the sensor arrangement is fashioned as a capacitor having a porous cooperating electrode. The channels are preferably produced by electrochemical etching.

REFERENCES:
patent: 4275406 (1981-06-01), Muller et al.
patent: 4433470 (1984-02-01), Kameyama et al.
patent: 4555661 (1985-11-01), Benson et al.
patent: 4685197 (1987-08-01), Tigelaar et al.
patent: 4759822 (1988-07-01), Vetanen et al.
patent: 4808259 (1989-02-01), Jillie, Jr. et al.
patent: 4827323 (1989-05-01), Tigelaar et al.
patent: 4916114 (1990-04-01), Hoenig
patent: 5262021 (1993-11-01), Lehmann et al.
patent: 5306647 (1994-04-01), Lehmann et al.
patent: 5338416 (1994-08-01), Mlcak et al.
patent: 5365405 (1994-11-01), Hoenlein et al.
patent: 5371410 (1994-12-01), Chen et al.
patent: 5403752 (1995-04-01), Brochhaus et al.
patent: 5464509 (1995-11-01), Mlcak et al.
patent: 5500385 (1996-03-01), Wendt et al.

Affiliated with

Also associated with

Rating

Sensor arrangement does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Sensor arrangement, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Sensor arrangement will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1225952