Sensor alignment apparatus for an analysis system

Optics: measuring and testing – By alignment in lateral direction – With light detector

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C356S039000, C356S073000, C356S335000, C356S337000, C108S137000, C108S138000, C108S144110, C248S124100, C248S157000, C248S176100, C248S424000, C248S913000

Reexamination Certificate

active

10923974

ABSTRACT:
An apparatus for analyzing a population of particles is set forth. The apparatus includes an emitter adapted to generate a beam of electromagnetic radiation, such as from a laser, and a particle chamber disposed in a path of the electromagnetic radiation beam. The apparatus also includes a sensor to detect electromagnetic radiation scattered by or otherwise received from the particle chamber. A sensor alignment unit supports the sensor along a detection axis and allows adjustment of the position of the sensor along orthogonal axes lying in a plane that is generally perpendicular to the detection axis. In one embodiment, the sensor alignment unit includes a first support platform and a first adjustment mechanism disposed to adjust the position of the first support platform along a first orthogonal axis. The sensor alignment unit also includes a second support platform that supports the sensor. The second support platform is connected to the first support platform in such a manner as to allow the second support platform to move along a second orthogonal axis. A second adjustment mechanism is provided to adjust the position of the second support platform with respect to the first support platform along the second orthogonal axis. In this manner, the position of the sensor can be adjusted to optimize detection of the desired particle characteristics.

REFERENCES:
patent: 4333044 (1982-06-01), Blitchington
patent: 4409860 (1983-10-01), Moriyama et al.
patent: 4723086 (1988-02-01), Leibovich et al.
patent: 5020357 (1991-06-01), Kovacevic et al.
patent: 5040059 (1991-08-01), Leberl
patent: 5093234 (1992-03-01), Schwartz
patent: 5125737 (1992-06-01), Rodriguez et al.
patent: 5135302 (1992-08-01), Hirako
patent: 5323012 (1994-06-01), Auslander et al.
patent: 5453840 (1995-09-01), Parker et al.
patent: 5629765 (1997-05-01), Schmutz
patent: 5675517 (1997-10-01), Stokdijk
patent: 6417920 (2002-07-01), Shimaoka
patent: 6456375 (2002-09-01), Ottens et al.
patent: 6532069 (2003-03-01), Otsuki et al.
patent: 6784981 (2004-08-01), Roche et al.
patent: 6873420 (2005-03-01), Davis et al.
patent: 6954262 (2005-10-01), Buzzetti

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Sensor alignment apparatus for an analysis system does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Sensor alignment apparatus for an analysis system, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Sensor alignment apparatus for an analysis system will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3883437

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.