Sensitized photoinitiator system for addition polymerization

Details Sensitized photoinitiator system for addition polymerization Sensitized photoinitiator system for addition polymerization

1988-11-23

1990-05-01

Garvin, Patrick P.

Catalyst, solid sorbent, or support therefor: product or process

Catalyst or precursor therefor

Organic compound containing

430281, C08F 400

Patent

active

049218271

ABSTRACT:
A visible light sensitive free radical polymerization photoinitiator composition comprising (a) an initiator selected from diaryl iodonium salts, halogenated triazines, and triaryl sulfonium salts having a reduction potential in the range 0.0 to -1.5 eV, and (b) at least one merocyanine sensitizer containing a constrained alkylamino group.
These initiator compositions give high speed polymerization reactions with ethylenically unsaturated monomers and oligomers.

REFERENCES:
patent: 3961961 (1976-06-01), Rich
patent: 4257915 (1981-03-01), Eaton
patent: 4278751 (1981-07-01), Specht et al.
patent: 4791045 (1988-12-01), Mitra etal.
patent: 4792506 (1988-12-01), DeVoe et al.
"Colloids and Surfaces in Reprographic Technology," T. L. Penner and D. Mobius, ACS Symposium Series 200, M. Hair and M. D. Croucher, Eds. 1982, pp. 111-122.
U.S. Patent Application Ser. No. 07/034,065, filed Apr. 2, 1987.

Affiliated with

Also associated with

Rating

Sensitized photoinitiator system for addition polymerization does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Sensitized photoinitiator system for addition polymerization, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Sensitized photoinitiator system for addition polymerization will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-829470