Sensitive resins comprising 2-alkylglycidyl methacrylate homopol

Details Sensitive resins comprising 2-alkylglycidyl methacrylate homopol Sensitive resins comprising 2-alkylglycidyl methacrylate homopol

1982-01-25

1983-10-04

Wong, Jr., Harry

Stock material or miscellaneous articles

Composite

Of metal

428522, 526273, B32B 1508, B32B 2730, C08F 2032

Patent

active

044078951

ABSTRACT:
Photo, electron beam and x-ray sensitive resins are comprised of a 2-alkylglycidyl methacrylate homopolymer or a copolymer containing at least 50 mol % of alkylglycidyl methacrylate. The resins have excellent resolving power and sensitivity and are useful for negative type resists.

REFERENCES:
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patent: 3923761 (1975-12-01), Parker et al.
patent: 4051194 (1977-09-01), Ishikawa et al.
patent: 4068061 (1978-01-01), Nakagawa et al.
patent: 4087569 (1978-05-01), Hatzakis
patent: 4269962 (1981-05-01), Kalal et al.
L. F. Thompson, et al., J. Vac. Sci. Technol., vol. 12, No. 6, Nov./Dec. 1975, pp. 1280-1283, Molecular Parameters and Lithographic Performance of poly (glycidyl methacrylate-co-ethylate); A Negative Electron Resist.
Y. Taniguchi et al.; Jap. J. Appl. Physics, vol. 18, No. 6, Jun. 1979, pp. 1143-1148, PGMA As a High Resolution, High Sensitivity Negative Electron Beam Resist.

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