Sensing devices and methods for forming the same

Active solid-state devices (e.g. – transistors – solid-state diode – Responsive to non-electrical signal

Reexamination Certificate

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C257S433000, C257SE51011, C257SE21576, C257SE21581

Reexamination Certificate

active

07872318

ABSTRACT:
A sensing device includes an optical cavity having two substantially opposed reflective surfaces. At least one nanowire is operatively disposed in the optical cavity. A plurality of metal nanoparticles is established on the at least one nanowire.

REFERENCES:
patent: 6297063 (2001-10-01), Brown et al.
patent: 7087920 (2006-08-01), Kamins
patent: 2003/0145779 (2003-08-01), Alivisatos et al.
patent: 2004/0175844 (2004-09-01), Yang et al.
patent: 2005/0133476 (2005-06-01), Islam et al.
patent: 2006/0038990 (2006-02-01), Habib et al.
patent: 2006/0055920 (2006-03-01), Wang et al.
patent: 2006/0097389 (2006-05-01), Islam et al.
Sun et al., “Silicon Nanowires Wrapped with Au Film” J. Phys. Chem. B 2002, 106, 6980-6984.
X. H. Sun et al., “Zero-Dimensional Nanodots on One-Dimensional Nanowires: Reductive Deposition of Metal Nanoparticles on Silicon Nanowires”, Jun. 2004, pp. 199-224, vol. 15, No. 2.
Yasseri, A. et al., “Growth and use of metal nanocrystal assemblies on high-density silicon nanowires formed by chemical vapor deposition,” Appl Phys A, 82, 2006, pp. 659-664.

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