Sensing component used to monitor material buildup and...

Details Sensing component used to monitor material buildup and... Sensing component used to monitor material buildup and...

2006-09-19

2006-09-19

Toatley, Jr., Gregory J. (Department: 2877)

Optics: measuring and testing

By dispersed light spectroscopy

With sample excitation

Reexamination Certificate

active

07110110

ABSTRACT:
A sensing device for sensing a condition of a plasma processing system component. The sensing device includes a main body configured to contain a material, an emitter contained in the main body and configured to emit light when exposed to a plasma, and a mating feature connected to the main body and configured to be mated with a receiving feature of an object in the plasma processing system such that the emitter material is exposed to a processing environment of the plasma processing system. When the emitter material is exposed to a plasma, the light emitted from the emitter can be monitored to determine at least one of material accumulation on the system component and erosion of the system component.

REFERENCES:
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patent: 5798016 (1998-08-01), Oehrlein et al.
patent: 5947053 (1999-09-01), Burnham et al.
patent: 2002/0149001 (2002-10-01), Ellens et al.

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