Coating processes – Electrical product produced – Integrated circuit – printed circuit – or circuit board
Patent
1979-06-25
1980-12-16
Newsome, John H.
Coating processes
Electrical product produced
Integrated circuit, printed circuit, or circuit board
427 431, 427 541, 430326, 430328, B05D 306
Patent
active
042397871
ABSTRACT:
A semitransparent photolithography mask, i.e., one transparent to a portion of the visible light spectrum, is achieved by electron and ion bombardment of a positive photoresist. This bombardment is performed after the desired photoresist pattern is defined by the sequential steps of depositing, baking and developing the photoresist (14) on a light transparent substrate (15). In the preferred embodiment, the electron and ion bombardment is accomplished in a predominantly nitrogen atmosphere within a sputtering chamber using indium tin oxide as the sputtering target. As a result of the bombardment, the photoresist is converted into a material which is opaque to only the ultraviolet portion of the light spectrum.
REFERENCES:
patent: 3443915 (1969-05-01), Wood et al.
patent: 3920483 (1975-11-01), Johnson et al.
patent: 3949259 (1976-04-01), Kostlin et al.
patent: 4093504 (1978-06-01), Ponjee et al.
patent: 4137365 (1979-01-01), Fletcher
Elie, "IBM Tech. Disc. Bull.," vol. 17, No. 1, p. 85, Jun. 1974.
Fredericks, "IBM Tech. Disc. Bull.," vol. 21, No. 7, p. 2824, Dec. 1978.
Bell Telephone Laboratories Incorporated
Newsome John H.
Padnes David R.
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