Semipermeable liquid crystal display device and...

Details Semipermeable liquid crystal display device and... Semipermeable liquid crystal display device and...

2005-12-13

2005-12-13

Kim, Robert (Department: 2871)

Liquid crystal cells, elements and systems

Particular structure

Having significant detail of cell structure only

C349S043000, C349S110000

Reexamination Certificate

active

06975375

ABSTRACT:
Simplified manufacturing method for active matrix type semipermeable liquid crystal display devices also having improved productivity. In a manufacturing method for an active matrix type semipermeable liquid crystal display device, an interlayered insulator film is formed and processed in process A for forming an interlayered insulator film on a silicon layer forming the source and drain of the TFT; in a process B for forming a photoresist layer on the interlayered insulator film; in a process C for forming the photoresist layer in a designated pattern using a mask formed with a pattern below the resolution limit in the section for forming the reflecting electrode; in a process D for patterning the photoresist layer made in process C as the etching mask for etching the interlayered insulator film. After the process D, a source electrode, signal lines, drain electrode and reflecting electrode are simultaneously formed from the metallic film.

REFERENCES:
patent: 5949507 (1999-09-01), Shimada et al.
patent: 6225966 (2001-05-01), Ohtani et al.
patent: 6295109 (2001-09-01), Kubo et al.
patent: 6342935 (2002-01-01), Jang et al.
patent: 6466280 (2002-10-01), Park et al.
patent: 6562670 (2003-05-01), Shih

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