Semiconductor yield management system and method

Data processing: generic control systems or specific application – Specific application – apparatus or process – Product assembly or manufacturing

Reexamination Certificate

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C700S108000, C700S031000

Reexamination Certificate

active

06470229

ABSTRACT:

BACKGROUND OF THE INVENTION
This invention relates generally to a system and method for managing a semiconductor process and in particular to a system and method for managing yield in a semiconductor process.
The semiconductor industry is continually pushing toward smaller and smaller geometries of the semiconductor devices being produced since smaller devices generate less heat and operate at a higher speed than larger devices. Currently, a single chip may contain over one billion patterns. The semiconductor manufacturing process is extremely complicated since it involves hundreds of processing steps. A mistake or small error at any of the process steps or tool specifications may cause lower yield in the final semiconductor product, wherein yield may be defined as the number of functional devices produced by the process as compared to the theoretical number of devices that could be produced assuming no bad devices. Improving yield is a critical problem in the semiconductor industry and has a direct economic impact to the semiconductor industry. In particular, a higher yield translates into more devices that may be sold by the manufacturer.
Semiconductor manufacturing companies have been collecting data for a long time about various process parameters in an attempt to improve the yield of the semiconductor process. Today, an explosive growth of database technology has contributed to the yield analysis that each company follows. In particular, the database technology has far outpaced the yield management ability when using conventional statistical methods to interpret and relate yield to major yield factors. This has created a need for a new generation of tools and techniques for automated and intelligent database analysis for yield management.
Current conventional yield management systems have a number of limitations and disadvantages which make them less desirable to the semiconductor industry. For example, the conventional systems may require some manual processing which slows the analysis and makes it susceptible to human error. In addition, these conventional systems may not handle both continuous and categorical yield management variables. Some conventional systems cannot handle missing data elements and do not permit rapid searching through hundreds of yield parameters to identify key yield factors. Some conventional systems output data that is difficult to understand or interpret even by knowledgeable semiconductor yield management people. In addition, the conventional systems typically process each yield parameter separately, which is time consuming and cumbersome and cannot identify more than one parameter at a time.
Thus, it is desirable to provide a yield management system and method which solves the above limitations and disadvantages of the conventional systems and it is to this end that the present invention is directed.
SUMMARY OF THE INVENTION
The yield management system and method in accordance with the invention may provide many advantages over conventional methods and systems which make the yield management system and method more useful to semiconductor device manufacturers. In particular, the system may be fully automated and easy to use so that no extra training is necessary to make use of the yield management system. In addition, the system handles both continuous (e.g., temperature) and categorical (e.g., Lot
1
, Lot
2
, etc.) variables. The system also automatically handles missing data during a pre-processing step. The system can rapidly search through hundreds of yield parameters and generate an output indicating the one or more key yield factors/parameters. The system generates an output (a decision tree) that is easy to interpret and understand. The system is also very flexible in that it permits prior yield parameter knowledge (from users) to be easily incorporated into the building of the model in accordance with the invention. Unlike conventional systems, if there is more than one yield factor/parameter affecting the yield of the process, the system can identify all of the parameters/factors simultaneously so that the multiple factors are identified during a single pass through the yield data.
In accordance with a preferred embodiment of the invention, the yield management method may receive a yield data set. When a data set comes in, it first goes through a data preprocessing step in which the validity of the data in the data set is checked and cases or parameters with missing data are eliminated. Using the cleaned up data set, a Yield Mine model is built during a model building step. Once the model is generated automatically by the yield management system, the model may be modified by one or more users based on their experience or prior knowledge of the data set. Once the model has been modified, the data set may be processed using various statistical analysis tools to help the user better understand the relationship between the response and predict variables.


REFERENCES:
patent: 4754410 (1988-06-01), Leech et al.
patent: 6098063 (2000-08-01), Xie et al.
patent: 6336086 (2002-01-01), Perez et al.

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