Cleaning and liquid contact with solids – Apparatus – With plural means for supplying or applying different fluids...
Patent
1997-05-15
2000-11-14
Coe, Philip R.
Cleaning and liquid contact with solids
Apparatus
With plural means for supplying or applying different fluids...
134 953, 134902, B08B 704
Patent
active
061455199
ABSTRACT:
A semiconductor workpiece cleaning apparatus includes a cleaning arrangement that cleans a semiconductor workpiece by use of a cleaning liquid, a charging arrangement that brings into a chamber a drying liquid, and a discharging arrangement that discharges the cleaning liquid. The cleaning arrangement cleans the workpiece by spraying chemical liquid and/or pure water in the chamber, and by immersing the workpiece in the chemical liquid and/or pure water. The charging arrangement takes in the drying chemical liquid or vapor so as to contact the processing chemical liquid or pure water in which the semiconductor workpiece is immersed. The discharging arrangement discharges the processing chemical liquid or pure water while preserving an interface between the processing chemical liquid or pure water and the drying chemical liquid or vapor.
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Ban Cozy
Konishi Toko
Coe Philip R.
Mitsubishi Denki & Kabushiki Kaisha
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