Semiconductor workpiece apparatus

Heating – Accessory means for holding – shielding or supporting work... – Support structure for heat treating ceramics

Reexamination Certificate

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C206S711000, C211S041180

Reexamination Certificate

active

06939132

ABSTRACT:
Various embodiments of an apparatus for holding and processing semiconductor workpieces are provided. In one aspect, an apparatus is provided that includes a first base, a second base and three elongated members coupled to and between the first base and the second base. The three elongated members are spatially arranged so that a semiconductor workpiece may be positioned therebetween. Each of the elongated members has a first lateral edge, a second lateral edge and at least one radially inwardly projecting member. The at least one radially inwardly projecting member has a third lateral edge, a fourth lateral edge and an upper surface for receiving a portion of the semiconductor workpiece and a lower surface. The third lateral edge is displaced laterally inward from the first lateral edge and the fourth lateral edge is displaced laterally inward from the second lateral edge.

REFERENCES:
patent: 5921773 (1999-07-01), Lee
patent: 5931666 (1999-08-01), Hengst
patent: 6206197 (2001-03-01), Decamps et al.
patent: 6607381 (2003-08-01), Minami et al.
patent: 1020020068267 (2002-08-01), None
Stanley Middleman et al.;Process Engineering Analysis in Semiconductor Device Fabrication; Jan. 1993; pp. 547-48.
Saint Gobain Semiconductor Components Group;Crystal®Vertical Wafer Boats Web Page; http://www.crystar.com/vertboat.html; 2000; pp. 1-2.
Daniel M. Dobbin;Tube Reactor: Overview;http://www.batnet.com/enigmatics/semiconductor_processing/CVD_Fundamentals/reactors/tube_reactor.html; Dec. 2001; pp. 1-2.

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