Semiconductor wafer susceptor

Details Semiconductor wafer susceptor Semiconductor wafer susceptor

2006-04-04

2006-04-04

Hassanzadeh, Parviz (Department: 1763)

Coating apparatus

Gas or vapor deposition

With treating means

C118S728000, C206S832000, C219S444100, C219S544000, C392S416000, C392S418000, C156S345510

Reexamination Certificate

active

07022192

ABSTRACT:
A semiconductor wafer susceptor for batch substrate processing. The susceptor includes a central region in a primary plane and a plurality of flat annular extensions extending below the central region in a secondary plane. The primary and secondary planes are parallel to each other. An edge of the substrate overhangs the central region allowing no contact of the susceptor with the substrate edge.

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