Semiconductor wafer, semiconductor device and method of...

Active solid-state devices (e.g. – transistors – solid-state diode – Non-single crystal – or recrystallized – semiconductor... – Non-single crystal – or recrystallized – material with...

Reexamination Certificate

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C257S327000, C257S328000, C257SE21014

Reexamination Certificate

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08039843

ABSTRACT:
A semiconductor substrate according to an embodiment includes: a first semiconductor wafer having a first crystal; and a second semiconductor wafer formed of a second crystal substantially same as the first crystal on the first semiconductor wafer, a crystal-axis direction of unit cell thereof being twisted at a predetermined angle around a direction vertical to a principal surface of the second semiconductor wafer from that of the first semiconductor wafer.

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patent: 2004/0075141 (2004-04-01), Maeda et al.
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patent: 2006/0027870 (2006-02-01), Inaba
patent: 2007/0190708 (2007-08-01), Kaneko et al.
patent: 2007/0221956 (2007-09-01), Inaba
patent: 5-90117 (1993-04-01), None
patent: 2004-140148 (2004-05-01), None
patent: 2005-136410 (2005-05-01), None
patent: 2005-166865 (2005-06-01), None
patent: 2005-294828 (2005-10-01), None
patent: WO 2005/124871 (2005-12-01), None
B. Doris, et al, “A Simplified Hybrid Orientation Technology (SHOT) for High Performance CMOS”, IEEE Symposium on VLSI Technology Digest of Technical Papers, 2004, pp. 86-87.

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