Drying and gas or vapor contact with solids – Apparatus – With apparatus using centrifugal force
Patent
1997-03-07
1999-12-07
Bennett, Henry A.
Drying and gas or vapor contact with solids
Apparatus
With apparatus using centrifugal force
414938, 414940, 414217, 414222, 134902, 1341023, F26B 1724
Patent
active
059962410
ABSTRACT:
A processor for processing integrated circuit wafers, semiconductor substrates, data disks and similar units requiring very low contamination levels. The processor has an interface section which receives wafers in standard wafer carriers. The interface section transfers the wafers from carriers onto novel trays for improved processing. The interface unit can hold multiple groups of multiple trays. A conveyor having an automated arm assembly moves wafers supported on a tray. The conveyor moves the trays from the interface along a track to several processing stations. The processing stations are accessed from an enclosed area adjoining the interface section.
REFERENCES:
patent: 4431361 (1984-02-01), Bayne
patent: 4449885 (1984-05-01), Hertel et al.
patent: 4840530 (1989-06-01), Nguyen
patent: 4924890 (1990-05-01), Giles et al.
patent: 5055036 (1991-10-01), Asano et al.
patent: 5125784 (1992-06-01), Asano
patent: 5232328 (1993-08-01), Owczarz et al.
patent: 5301700 (1994-04-01), Kamikawa et al.
patent: 5544421 (1996-08-01), Thompson et al.
Berner Robert W.
Culliton Stephen P.
Curtis Gary L.
Thompson Raymon F.
Wright Blaine G.
Bennett Henry A.
Semitool Inc.
Wilson Pamela A.
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