Semiconductor wafer inspection system

Details Semiconductor wafer inspection system Semiconductor wafer inspection system

2006-08-15

2006-08-15

Nghiem, Michael (Department: 2863)

Data processing: measuring, calibrating, or testing

Measurement system in a specific environment

Mechanical measurement system

C702S036000, C438S012000, C134S001300

Reexamination Certificate

active

07092826

ABSTRACT:
A method and system for identifying a defect or contamination on a surface of a material. The method and system involves providing a material, such as a semiconductor wafer, using a non-vibrating contact potential difference sensor to scan the wafer, generate contact potential difference data and processing that data to identify a pattern characteristic of the defect or contamination.

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