Semiconductor wafer inspection device and method

Optics: measuring and testing – Inspection of flaws or impurities – Transparent or translucent material

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C356S237200

Reexamination Certificate

active

07576852

ABSTRACT:
The surface of an epitaxial wafer is inspected using an optical scattering method. The intensities of light scattered with a narrow scattering angle and light scattered with a wide scattering angle reflected from laser light scatterers (LLS) on the wafer surface are detected. If the intensifies of narrowly and widely scattered lights are within a prescribed sizing range, it is judged whether the laser light scatterer is a particle or killer defect by deciding into which zone (410, 414, 418, 439) within the sizing range the PLS size based on the narrowly scattered light intensity and the PLS size based, on the widely scattered light intensity fall. If the intensity of the narrowly or widely scattered light exceeds the sizing range (417, 420, 421, 423, 424, 425), or if a plenty of laser light scatterers are continuous or concentrated (422), the laser light scatterers are judged to be killer defects.

REFERENCES:
patent: 6271916 (2001-08-01), Marxer et al.
patent: 6515742 (2003-02-01), Ruprecht
patent: 2002/0036771 (2002-03-01), Sato et al.
patent: H11-126736 (1999-05-01), None
patent: 2001-176943 (2001-06-01), None
patent: 2002-098645 (2002-04-01), None
patent: WO-01/27600 (2001-04-01), None

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Semiconductor wafer inspection device and method does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Semiconductor wafer inspection device and method, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Semiconductor wafer inspection device and method will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-4137079

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.