Optics: measuring and testing – Inspection of flaws or impurities – Having predetermined light transmission regions
Patent
1994-09-20
1995-11-07
McGraw, Vincent P.
Optics: measuring and testing
Inspection of flaws or impurities
Having predetermined light transmission regions
359884, G01N 2188
Patent
active
054651450
ABSTRACT:
Disclosed is a semiconductor wafer inspection apparatus which effectively prevents an erroneous identification of small pits as particles on a surface of a sample. In such a semiconductor wafer inspection apparatus, a light collecting portion and a reflection adjustment portion having a light reflectance different from a light reflectance of the light collecting portion are included in light collecting means.
REFERENCES:
patent: 4601576 (1986-07-01), Galbraith
"Comparison of Two Wafer Inspection Methods for Particle Monitoring in Semiconductor Manufacturing", Leon Pesotchinsky et al., IEEE Transactions on Semiconductor Manufacturing, vol. 1, No. 1, Feb. 1988, pp. 16-22.
"Particle-Free Wafer Cleaning and Drying Technology", H. Mishima et al., IEEE Transactions on Semiconductor Manufacturing, vol. 2., No. 3 Aug. 1989, pp. 69-75.
"Particle Deposition and Removal in Wet Cleaning Processes for ULSI Manufacturing", Mitsushi Itano et al., IEEE Transactions on Semiconductor Manufacturing, vol. 5, No. 2, May 1992, pp. 114-120.
Nakashige Yukiko
Nishioka Tadashi
McGraw Vincent P.
Mitsubishi Denki & Kabushiki Kaisha
Ryoden Semiconductor System Engineering Corporation
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