Coating apparatus – Work holders – or handling devices
Patent
1997-09-10
1999-12-14
Tentoni, Leo B.
Coating apparatus
Work holders, or handling devices
118728, 211 4118, 269296, B05C 1100, C23C 1600
Patent
active
060011807
ABSTRACT:
A semiconductor wafer holder includes a contact part with a held object to be held. The contact part is constructed of a sintered silicon carbide substrate and then coated with a dense CVD silicon carbide film which has at least one crystal plane orientation out of the (111), (110), (220) and (200) planes in Miller indices to provide excellent grindability despite high hardness to withstand abrasive wear, thus facilitating surface grinding of the contact part into an ultra smooth and flat surface without dust and pit holes. This composite material has a large modulus of elasticity, a small specific gravity, and a very low coefficient of thermal expansion, creating high strength and little change in spite of exposure heat and maintaining dimensional stability in circuit printing. The sintered material together with the crystallized CVD silicon carbide film of the .beta. structure offers an electric resistance under 10.sup.10 .OMEGA..multidot.cm to provide high conductivity, thereby preventing static dust and facilitating cleaning up.
REFERENCES:
patent: 4587928 (1986-05-01), Yonezawa et al.
patent: 4987016 (1991-01-01), Ohto et al
Nippon Pillar Packing Co. Ltd.
Tentoni Leo B.
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