Semiconductor wafer heater with infrared lamp module with light

Electric resistance heating devices – Heating devices – Radiant heater

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Details

392316, 118724, H01L 2120

Patent

active

053455347

ABSTRACT:
A thin reflective cylindrical baffle [20] in a radiant lamp heater is provided in the space below a plurality of heating bulbs [2,4,6] (arranged in a center position and around a middle and outer ring) and above a quartz window [12]. The baffle diameter is such that it fits within the annular space between the middle [4] and outer [6]ring of bulbs. The baffle which blocks a predetermined amount of light generated by the lamp bulbs [20] allows improved controllability of wafer temperature profile--for a wafer heated by a radiant lamp heater.

REFERENCES:
patent: 4508960 (1985-04-01), Arai
patent: 5233163 (1993-08-01), Mieno et al.

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