Semiconductor wafer for providing a plurality of semiconductor c

Details Semiconductor wafer for providing a plurality of semiconductor c Semiconductor wafer for providing a plurality of semiconductor c

1986-10-21

1988-12-13

LaRoche, Eugene R.

Radiant energy

Means to align or position an object relative to a source or...

2504922, 356401, A61N 500

Patent

active

047913029

ABSTRACT:
A semiconductor wafer to be processed with the electron-beam lithography and provided with a registration mark is disclosed. The registration mark is comprised of a plurality of patterns having the same shape and arranged in one direction with a constant interval. The pattern may be protruded or grooved from the part surrounding the pattern.

REFERENCES:
patent: 3849659 (1974-11-01), O'Keeffe
patent: 4327292 (1982-04-01), Wang et al.
patent: 4564764 (1986-01-01), Yasuda et al.
patent: 4590382 (1986-05-01), Tabata
patent: 4712016 (1987-12-01), Matsumura

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